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Standard Mosai Mold Explanation Part 2

Standard Mosai Mold Explanation Part 2

Introducing the explanation of the Standard Moss Eye mold part 2 in blog format!

This is the second installment of the explanation of the specs for the moth-eye mold. In interference lithography, only linear structures can be drawn with the interference wave. However, by performing double exposure, it is possible to create a moth-eye structure. In the diagram, the green dotted line indicates the lines drawn by the interference wave. There are two types of parallel dotted lines in the diagram that intersect with each other. *For more detailed information, please refer to the related links. Feel free to contact us for further inquiries.*

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Interference lithography

Interference lithography

Patterns are recorded in photosensitive materials! There is no need for masks or scanning processes.

"Interference Lithography" is a method that can form microstructures over a wide area through a parallel process (interference between two laser beams). The UV laser split by a splitter is magnified and exposed to form interference fringes. Additionally, by rotating the substrate to adjust the interference of the laser, it is possible to change the shape of the desired pattern, eliminating the need for masks or scanning processes. [Features] - Forms microstructures over a wide area through a parallel process - Magnifies and exposes the UV laser split by a splitter to form interference fringes - Patterns are recorded on photosensitive materials *For more details, please refer to the related links or feel free to contact us.

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